JPS61191954A - スズ酸化物薄膜ガスセンサ素子 - Google Patents
スズ酸化物薄膜ガスセンサ素子Info
- Publication number
- JPS61191954A JPS61191954A JP60032228A JP3222885A JPS61191954A JP S61191954 A JPS61191954 A JP S61191954A JP 60032228 A JP60032228 A JP 60032228A JP 3222885 A JP3222885 A JP 3222885A JP S61191954 A JPS61191954 A JP S61191954A
- Authority
- JP
- Japan
- Prior art keywords
- plane
- oxide
- thin film
- line
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 26
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 12
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 12
- 239000013078 crystal Substances 0.000 claims abstract description 11
- 230000005855 radiation Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 20
- 239000004065 semiconductor Substances 0.000 abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 12
- 239000000463 material Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 7
- 229910052681 coesite Inorganic materials 0.000 abstract description 6
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 6
- 229910052682 stishovite Inorganic materials 0.000 abstract description 6
- 229910052905 tridymite Inorganic materials 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 5
- 229910052725 zinc Inorganic materials 0.000 abstract description 2
- 238000001704 evaporation Methods 0.000 abstract 7
- 230000008020 evaporation Effects 0.000 abstract 4
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000007792 gaseous phase Substances 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 37
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 14
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 10
- 229910001887 tin oxide Inorganic materials 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 8
- 229910052739 hydrogen Inorganic materials 0.000 description 8
- 238000001514 detection method Methods 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000005245 sintering Methods 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910000423 chromium oxide Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 229910000484 niobium oxide Inorganic materials 0.000 description 2
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- -1 tasixdene oxide Chemical compound 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60032228A JPS61191954A (ja) | 1985-02-20 | 1985-02-20 | スズ酸化物薄膜ガスセンサ素子 |
| GB08624904A GB2182448B (en) | 1985-02-20 | 1986-02-19 | Tin oxide thin film gas sensor component |
| PCT/JP1986/000077 WO1986004989A1 (en) | 1985-02-20 | 1986-02-19 | Gas sensor element of tin oxide film |
| KR1019860700721A KR940002511B1 (ko) | 1985-02-20 | 1986-02-19 | 산화주석 박막 가스 센서 소자 |
| GB868625006A GB8625006D0 (en) | 1985-02-20 | 1986-10-18 | Gas sensor element of tin oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60032228A JPS61191954A (ja) | 1985-02-20 | 1985-02-20 | スズ酸化物薄膜ガスセンサ素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61191954A true JPS61191954A (ja) | 1986-08-26 |
| JPH053895B2 JPH053895B2 (en]) | 1993-01-18 |
Family
ID=12353109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60032228A Granted JPS61191954A (ja) | 1985-02-20 | 1985-02-20 | スズ酸化物薄膜ガスセンサ素子 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS61191954A (en]) |
| KR (1) | KR940002511B1 (en]) |
| GB (2) | GB2182448B (en]) |
| WO (1) | WO1986004989A1 (en]) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS638548A (ja) * | 1986-06-27 | 1988-01-14 | Osaka Gas Co Ltd | ガスセンサ及びその製造方法 |
| JP2008169662A (ja) * | 2007-01-15 | 2008-07-24 | Shin Caterpillar Mitsubishi Ltd | パネルおよびその製造方法 |
| CN104568002A (zh) * | 2014-12-26 | 2015-04-29 | 昆山工研院新型平板显示技术中心有限公司 | 环境检测装置 |
| CN106092200A (zh) * | 2016-07-08 | 2016-11-09 | 南京信息工程大学 | 一种环境检测装置 |
| US10281420B2 (en) | 2016-04-26 | 2019-05-07 | Panasonic Intellectual Property Management Co., Ltd. | Gas-detecting apparatus including gas sensor and method of detecting hydrogen using gas sensor |
| US10309916B2 (en) | 2016-04-26 | 2019-06-04 | Panasonic Intellectual Property Management Co., Ltd. | Gas-detecting apparatus including gas sensor and method of detecting hydrogen using gas sensor |
| US11536677B2 (en) | 2016-12-28 | 2022-12-27 | Nuvoton Technology Corporation Japan | Gas detection device, gas sensor system, fuel cell vehicle, and hydrogen detection method |
| US11541737B2 (en) | 2016-12-28 | 2023-01-03 | Nuvoton Technology Corporation Japan | Gas detection device, gas detection system, fuel cell vehicle, and gas detection method |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9512929D0 (en) * | 1995-06-24 | 1995-08-30 | Sun Electric Uk Ltd | Multi-gas sensor systems for automatic emissions measurement |
| US6134944A (en) * | 1999-04-29 | 2000-10-24 | The Regents Of The University Of California | System and method for preconcentrating, identifying, and quantifying chemical and biological substances |
| DE102013218840A1 (de) | 2013-09-19 | 2015-03-19 | Robert Bosch Gmbh | Mikroheizplattenvorrichtung und Sensor mit einer Mikroheizplattenvorrichtung |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5811844A (ja) * | 1981-07-15 | 1983-01-22 | Matsushita Electric Ind Co Ltd | Ｎｏ↓２ガス検知器及び検知方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5424094A (en) * | 1977-07-26 | 1979-02-23 | Fuji Electric Co Ltd | Production of gas detecting element |
| JPS5983046A (ja) * | 1982-11-02 | 1984-05-14 | Hitachi Ltd | ガスセンサおよびその製造方法 |
| JPS5990040A (ja) * | 1982-11-15 | 1984-05-24 | Matsushita Electric Ind Co Ltd | 一酸化炭素ガス検知器 |
-
1985
- 1985-02-20 JP JP60032228A patent/JPS61191954A/ja active Granted
-
1986
- 1986-02-19 WO PCT/JP1986/000077 patent/WO1986004989A1/ja unknown
- 1986-02-19 GB GB08624904A patent/GB2182448B/en not_active Expired
- 1986-02-19 KR KR1019860700721A patent/KR940002511B1/ko not_active Expired - Fee Related
- 1986-10-18 GB GB868625006A patent/GB8625006D0/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5811844A (ja) * | 1981-07-15 | 1983-01-22 | Matsushita Electric Ind Co Ltd | Ｎｏ↓２ガス検知器及び検知方法 |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS638548A (ja) * | 1986-06-27 | 1988-01-14 | Osaka Gas Co Ltd | ガスセンサ及びその製造方法 |
| JP2008169662A (ja) * | 2007-01-15 | 2008-07-24 | Shin Caterpillar Mitsubishi Ltd | パネルおよびその製造方法 |
| US8163211B2 (en) | 2007-01-15 | 2012-04-24 | Caterpillar S.A.R.L. | Panel and method for manufacturing the same |
| CN104568002A (zh) * | 2014-12-26 | 2015-04-29 | 昆山工研院新型平板显示技术中心有限公司 | 环境检测装置 |
| US10281420B2 (en) | 2016-04-26 | 2019-05-07 | Panasonic Intellectual Property Management Co., Ltd. | Gas-detecting apparatus including gas sensor and method of detecting hydrogen using gas sensor |
| US10309916B2 (en) | 2016-04-26 | 2019-06-04 | Panasonic Intellectual Property Management Co., Ltd. | Gas-detecting apparatus including gas sensor and method of detecting hydrogen using gas sensor |
| CN106092200A (zh) * | 2016-07-08 | 2016-11-09 | 南京信息工程大学 | 一种环境检测装置 |
| US11536677B2 (en) | 2016-12-28 | 2022-12-27 | Nuvoton Technology Corporation Japan | Gas detection device, gas sensor system, fuel cell vehicle, and hydrogen detection method |
| US11541737B2 (en) | 2016-12-28 | 2023-01-03 | Nuvoton Technology Corporation Japan | Gas detection device, gas detection system, fuel cell vehicle, and gas detection method |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2182448A (en) | 1987-05-13 |
| GB2182448B (en) | 1989-01-11 |
| KR940002511B1 (ko) | 1994-03-25 |
| GB8625006D0 (en) | 1986-11-19 |
| GB8624904D0 (en) | 1986-11-19 |
| WO1986004989A1 (en) | 1986-08-28 |
| KR880700261A (ko) | 1988-02-22 |
| JPH053895B2 (en]) | 1993-01-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |